Advanced PECVD technology for manufacturing AM LCDs

Abstract

PECVD is one of the most critical technologies for manufacturing AM LCD devices. Advanced PECVD systems have been developed for low temperature deposition of a-Si, SiN/sub x/, SiO/sub 2/, SiON, and n-Si films. Typically, cluster tool configurations are used since they provide excellent process control with single substrate processing and flexible process flows. Recent reports indicate that good polysilicon TFTs have been manufactured using laser crystallization of a-Si precursor films. This paper reviews the development of PECVD systems for volume manufacturing of LCDs and discusses process technology and requirements for future manufacturing.