Photocurrent suppression and interface state recombination in MIS-Schottky barriers

K. Ng, H. Card
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引用次数: 6

Abstract

The purpose of this work is to understand an important degradation mechanism in Schottky barrier photodetectors and solar cells. The I-V characteristics of Au-nSi devices under illumination show a pronounced photocurrent suppression at low voltages in the presence of an interfacial oxide layer of thickness ≥ 20 A (intentionally introduced) but no suppression in the case of a carefully prepared near-intimate contact. The analysis of these devices takes into account the exchange of charge carriers between interface states and the metal (by tunneling) and between these states and the conduction and valence bands in the semiconductor. As suggested by the experiments, this shows that recombination in the interface states can be important only in the presence of a significant interfacial layer.
miss - schottky势垒中的光电流抑制和界面态重组
这项工作的目的是了解肖特基势垒光电探测器和太阳能电池中的一个重要降解机制。在照明条件下,Au-nSi器件的I-V特性表明,在厚度≥20a(有意引入)的界面氧化层存在的情况下,在低电压下有明显的光电流抑制,但在精心准备的近亲密接触情况下没有抑制。这些器件的分析考虑了界面态与金属之间(通过隧道)以及这些态与半导体中的导价带之间的载流子交换。正如实验所表明的那样,这表明只有在存在一个重要的界面层时,界面状态中的重组才会很重要。
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