Raman emission in porous silicon at 1.5 micron: a possible approach

L. Sirleto, M. Ferrara, L. Moretti, I. Rendina, A. Rossi, E. Santamato, B. Jalali
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Abstract

In this paper, in order to generate radiation at 1.54 micron, an approach based on Raman scattering in porous silicon is presented. Experimental results, proving spontaneous Raman emission at 1.5 micron and tuning of the Stokes shift, are reported. Finally, we discuss about the possibility to enhance the Raman gain coefficient and to eliminate two photon absorption in porous silicon.
多孔硅在1.5微米处的拉曼发射:一种可能的方法
为了产生1.54微米的辐射,本文提出了一种基于多孔硅拉曼散射的方法。实验结果证明了在1.5微米处的自发拉曼辐射和斯托克斯位移的调谐。最后,讨论了在多孔硅中提高拉曼增益系数和消除双光子吸收的可能性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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