Novel SiC Power Devices utilizing a Si/4H-SiC Heterojunction

M. Hoshi, T. Hayashi, H. Tanaka, S. Yamagami
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引用次数: 5

Abstract

We have developed novel SIC devices, both a diode and a transistor, utilizing a Si/4H-SiC heteroj unction. A heterojunction diode (HJD) was fabricated with P+ polycrystalline silicon on an N- epitaxial layer of 4H-SiC. The HJD achieved lower Von and higher reverse blocking voltage than a commercial Schottky barrier diode (SBD) of SiC. Switching charcteristics of the HJD indicated almost zero reverse recovery similar to that of a SBD. A hetero junction tunneling transistor (HETT) was driven by an insulated gate electrode. The width of the heterojunction barrier was controlled by the gate bias to allow tunneling current to flow. The HETT was fabricated with N+ polycrystalline silicon on an N- 4H-SiC epitaxial layer. The channnel length of the HETT was almost zero and was expected to have low on-resistance.
利用Si/4H-SiC异质结的新型SiC功率器件
我们已经开发了新的SIC器件,包括二极管和晶体管,利用Si/4H-SiC异质结。以P+多晶硅为材料,在4H-SiC的N-外延层上制备了异质结二极管。与商用肖特基势垒二极管(SBD)相比,HJD实现了更低的Von和更高的反向阻断电压。HJD的开关特性表明,与SBD类似,反向恢复几乎为零。采用绝缘栅电极驱动异质结隧道晶体管(HETT)。异质结势垒的宽度由栅极偏置控制,以允许隧道电流流过。用N+多晶硅在N- 4H-SiC外延层上制备了HETT。HETT的通道长度几乎为零,并且预计具有低导通电阻。
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