Comparison of individual SiC JBS chips and JBS stacks connected in series by diffusion welding

N. Sleptsuk, O. Korolkov, J. Toompuu, T. Rang
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引用次数: 1

Abstract

The comparison of JBS chips and JBS stacks connected in series by diffusion welding DW has been made using deep level spectroscopy (DLTS). As it was expected, JBS stacks are characterized by higher volumes of reverse voltage (Ur), higher series resistance (Rs) and, therefore, higher forward voltage (Uf). In the stacks two times reducing of capacitance has been fixed. Diffusion welding (DW) technique used for stacks allows to solve many packaging problems, in particular - reduction of thermal resistance and incresing in operation temperature.
扩散焊接单个SiC JBS芯片与串联JBS芯片的比较
利用深能级光谱(DLTS)对扩散焊接DW串联的JBS芯片和JBS堆叠进行了比较。正如预期的那样,JBS堆叠具有更高的反向电压(Ur)体积,更高的串联电阻(Rs),因此更高的正向电压(Uf)。在堆栈中,两次减少的电容已被固定。采用扩散焊(DW)技术可以解决许多封装问题,特别是热阻的降低和操作温度的提高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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