Design of Low Leakage Current Average Power CMOS Current Comparator Using SVL Technique

Sakshi Saxena, S. Akashe
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引用次数: 3

Abstract

This paper presents a low voltage, low leakage complementary metal oxide semiconductor current comparator using self-controlled voltage level technique. The self-controlled voltage level technique presents the integrated realization of an alternative method that is less intricate to implement. With the advancement in semiconductor technology, chip density and operating frequency are increasing, so the power consumption in VLSI circuit has become a major problem of consideration. This paper presented a complementary metal oxide circuit using self-controlled voltage level technique. A self-controllable voltage level (SVL) technique is mainly used to reduce leakage. In this technique when the supply voltage given 0.7V, input current given 1mA then power dissipates 165.6μW. By applying SVL technique on the circuit we measured the leakage power 1.233μW and leakage current 219.2pA then leakage current reduces 89% and leakage power reduces 35% than the traditional comparator. The technique based comparator fabricated on cadence virtuoso tool in 45nm technique. By Using this technology voltage and leakage reduces. The simulation & analytical results show that proposed circuit is correct.
基于SVL技术的低漏电流平均功率CMOS电流比较器设计
本文介绍了一种采用自控电压电平技术的低电压、低漏互补金属氧化物半导体电流比较器。自控制电压电平技术提供了一种替代方法的集成实现,实现起来不那么复杂。随着半导体技术的进步,芯片密度和工作频率不断提高,VLSI电路的功耗问题已成为一个重要的考虑问题。本文提出了一种采用自控电压电平技术的互补金属氧化物电路。自控电压电平(SVL)技术主要用于减少漏电。在该技术中,当电源电压为0.7V,输入电流为1mA时,功耗为165.6μW。将SVL技术应用于该电路,测得泄漏功率为1.233μW,泄漏电流为219.2pA,与传统比较器相比,泄漏电流降低89%,泄漏功率降低35%。在45nm工艺中,利用节拍virtuoso工具制作了基于该技术的比较器。采用该技术可降低电压和漏电。仿真和分析结果表明所提出的电路是正确的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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