LSI and VLSI research in Japan

Abstract

This report will review recent advancements in LSI and VLSI research in Japan, especially concerning the basic technology useful for microfabrica-tion. The first computer controlled vector scan electron beam exposure system in Japan was reported in 1967. Recently the variable-area rectangular technique has been experimentally pursued. Another group is working on probe forming by quadrupole lenses. In the processing field, a high frequency plasma system, a plasma transport system, and a high pressure oxidation system are under development. Various self-aligning devices, like Diffusion Self-Alignment, Multiple Wall Self-Alignment, and those which work near punch-through regions are described.