S. Yin, M. Miyauchi, T. Ma, Y. Inase, T. Sugawara, E. Nagae
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引用次数: 0
Abstract
Here we report newly developed stress-less hard (SLH) coating prepared with radical-assisted sputtering (RAS). Multilayered film stack shows comparable hardness and better balance of stress and roughness with SLH replacing conventional Si3N4 as high-index layers.
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