Method of scanning near-field optical lithography

Abstract

A contact scanning near-field optical lithography method has been developed to enable fabrication of different nanoelements; (metal, dielectric, etched in surface or its combinations) on the various surfaces (metal, dielectric, light- and heavy doped semiconductors). The method involves interaction of heated probe of scanning near-field optical microscope with two-layer coating, followed by pattern transfer onto sample surface. The software for creation of different nanoelements; is developed. The nanoelements; with characteristic dimensions of about 50 nm are fabricated.