Block-level designs of die-to-wafer bonded 3D ICs and their design quality tradeoffs

Abstract

In 3D ICs, block-level designs provide various advantages over designs done at other granularity such as gate-level because they promote the reuse of IP blocks. In this paper, we study block-level 3D-IC designs, where the footprint of the dies in the stack are different. This happens in case of die-to-wafer bonding, which is more popular choice for near-term low-cost 3D designs. We study design quality tradeoffs among three different ways to place through-silicon vias (TSVs): TSV-farm, TSV-distributed, and TSV-whitespace. In our holistic approach, we use wirelength, power, performance, temperature, and mechanical stress metrics to conduct comprehensive comparative studies on the three design styles. In addition, we provide analysis on the impact of TSV size and pitch on the design quality of these three styles.