Prototype double-sided silicon sensor (DSSS) for SDC detector

T. Ohsugi, Y. Iwata, H. Ohyama, M. Okada, T. Ohmoto, Y. Unno, T. Kohriki, N. Tamura, H. Miyata, M. Higuchi, K. Niwa, M. Nakamura, Y. Nagashima, M. Daigo, A. Murakami, S. Kobayashi, K. Yamamoto, K. Yamamura, Y. Muramaatsu
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引用次数: 1

Abstract

A full-size, double-sided, AC coupling sensor for the SDC central tracker was fabricated. The bias feeding resistor for each strip on both surfaces was implemented by a poly-Si line. The resistance was well controlled within a design value which is good enough to feed uniform bias to each strip. The ohmic-contact strip isolation was attained by inserting a p/sup +/ channel between n/sup +/ strips. The readout capacitance was minimized by making a narrow strip on the p/sup +/ side and by inserting a wide isolation p/sup +/ channel in the n/sup +/ strip side. The capacitance is measured to be 0.8 pF/cm on the p/sup +/ strip side and 1.13 pF/cm on the n/sup +/ strip side. The junction edge breakdown voltage has been pushed up to more than 150 V by an Al strip narrower than the implanted strip width.<>
用于SDC探测器的双面硅传感器(DSSS)原型
制作了用于SDC中心跟踪器的全尺寸双面交流耦合传感器。在两个表面上的每个条带的偏置馈电电阻由多晶硅线实现。电阻被很好地控制在一个设计值内,这个设计值足以给每个带材均匀的偏置。通过在n/sup +/条带之间插入p/sup +/通道实现欧姆接触条带隔离。通过在p/sup +/侧制作窄带,并在n/sup +/带侧插入宽隔离p/sup +/通道,可以最小化读出电容。测得电容在p/sup +/ strip侧为0.8 pF/cm,在n/sup +/ strip侧为1.13 pF/cm。通过比注入带宽度更窄的铝带,将结边击穿电压推高到150 V以上。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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