Slip defect generation on GaAs wafers during high temperature process: a thermoelastic study from a crystallographic viewpoint

Abstract

In this work we investigate the mechanism of slip defect generation, using a simple heat flow simulation during an MBE process, a wafer heating apparatus, and a thermoelastic analysis from a crystallographic viewpoint. We find that the slip defect pattern predicted from the analysis agrees with the experiment and confirm that slip defects are prone to occur at orientation flat (OF) and notch edge.