DESIGN OF A 6T SRAM CELL WITH MINIMAL POWER USING CADENCE VIRTUOSO

R.Nirmal, P.Nithila, K.Jayasudha, P.Velumani, M.Barkavi, Dr.D.F. Jingle Jabha
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Abstract

It has proven challenging for VLSI designers to lower leakage power at the nanoscale level. This is because high- end gadgets, battery-operated portable pads, and other communication tools are in high demand. Memories are made up of static RAM and dynamic RAM. SRAM has had a significant impact on the worldwide VLSI market sinceit is preferred over DRAM because to its rapid read and write access times. Using a 6T static random access memory cell, this study's novel approach to lowering leakage current at various technologies has been put forth. To reduce the 6T SRAM cell leaking power, three source biasing techniques are used. At 45 nanometer and 90 nm technology nodes, the three techniques are NMOS diode clamping, PMOS diode clamping, and NMOS-PMOS diode clamping. The implementation of a 6T SRAM cell using the Multiple Threshold CMOS (MTCMOS) technique at 45nm technology is also emphasised in this article. Using the cadence virtuoso tool, the simulation is completed and different power dissipations are examined for 45 nm and 90 nm technologies, respectively, at supply voltages of 0.45 V and 0.9 V. Comparing PMOS clamping to the other two suggested techniques, an average power reduction of 82.19% was observed.
使用cadence virtuoso以最小功耗设计6t内存单元
事实证明,在纳米级降低泄漏功率对超大规模集成电路设计者来说是一个挑战。这是因为高端设备、电池供电的便携式pad和其他通讯工具的需求量很大。存储器由静态RAM和动态RAM组成。SRAM对全球VLSI市场产生了重大影响,因为它比DRAM更受欢迎,因为它具有快速的读写访问时间。本研究利用6T静态随机存取存储单元,提出了在各种技术下降低漏电流的新方法。为了降低6T SRAM单元泄漏功率,采用了三种源偏置技术。在45纳米和90纳米技术节点上,三种技术分别是NMOS二极管箝位、PMOS二极管箝位和NMOS-PMOS二极管箝位。本文还强调了在45纳米技术下使用多阈值CMOS (MTCMOS)技术实现6T SRAM单元。利用cadence virtuoso工具完成了仿真,并分别在0.45 V和0.9 V电源电压下测试了45 nm和90 nm技术的不同功耗。将PMOS箝位与其他两种建议的技术进行比较,平均功耗降低82.19%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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