A better TID hardened Dopingless Lateral Bipolar Transitor on SiGe-OI design

L. B. Devi, Jitendra Kumar, A. Srivastava
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Abstract

Impact of Total Ionization Doze (TID) on the charge plasma induced dopingless lateral bipolar transistor on SiGe-OI is studied. This paper proposes a new TID hardened charge plasma induced dopingless bipolar design – Triple Sided Charge Plasma (3SCP) Symmetric Lateral Bipolar Transistor (SLBT) on SiGe-OI. With our proposed 3SCP design we were able to show that the TID impact on the current gain is hardened as compared to the already reported charged plasma dopingless design.
基于SiGe-OI设计的更好的TID硬化无掺杂侧双极晶体管
研究了总电离度(TID)对SiGe-OI上电荷等离子体诱导的无掺杂侧双极晶体管的影响。本文提出了一种新的TID强化电荷等离子体诱导无掺杂双极设计——SiGe-OI上的三侧电荷等离子体对称侧双极晶体管(SLBT)。通过我们提出的3SCP设计,我们能够证明与已经报道的带电等离子体无掺杂设计相比,TID对电流增益的影响是硬化的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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