Characterization of insulated-gate versus schottky-gate InAs/AlSb HEMTs

M. Malmkvist, E. Lefebvre, M. Borg, L. Desplanque, X. Wallart, G. Dambrine, S. Bollaert, J. Grahn
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引用次数: 2

Abstract

Fabrication and characterization of 225 nm gate-length InAs/AlSb HEMTs with excellent RF performance are reported. We show the importance of an insulating layer between the gate and the semiconductor to improve gm, fT and fmax, and most important from a noise perspective, the gate-leakage current IG. By using an insulated-gate, IG was reduced by two orders of magnitude. The insulated-gate HEMTs exhibited extrinsic fT and fmax of 155 GHz and 115 GHz, respectively, at VDS=0.5 V.
绝缘栅与肖特基栅InAs/AlSb HEMTs的表征
报道了具有优异射频性能的225 nm栅长InAs/AlSb hemt的制备和表征。我们展示了栅极和半导体之间的绝缘层对于改善gm, fT和fmax的重要性,以及从噪声角度来看最重要的栅极泄漏电流IG。通过使用绝缘栅极,IG降低了两个数量级。在VDS=0.5 V时,绝缘栅hemt的外部fT和fmax分别为155 GHz和115 GHz。
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