Improving the performances of polymer light-emitting diode by inserting an ultrathin NiO layer

Yongli Wang, Q. Niu, Yong Zhang, Xin Wang, M. He
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Abstract

Performances enhancements of polymer light-emitting diode (PLED) were realized by inserting an ultrathin layer of NiO between the anode and hole injection layer. For PLED, there is a large energy barrier for hole injection with commonly used indium tin oxide (ITO) as anode. With a thin layer of NiO deposited on ITO, the energy barrier was decreased because of the higher work function of NiO than ITO, which facilitated hole injection. Therefore, the balance of electron and hole current was improved and also PLED performances. Experimental results also showed that the PLED performances were very sensitive to the thickness of NiO. Thick NiO layer led to the reduction of device current density, and therefore, poor PLED performances because NiO has a higher resistivity value than that of ITO. It turns out that 1 nm is the optimal thickness of NiO among 1, 2, 4 and 8 nm to produce high efficiency PLEDs. After the insertion of 1 nm NiO, the maximum electroluminescence intensity of PLED was almost doubled.
通过插入超薄NiO层改善聚合物发光二极管的性能
通过在聚合物发光二极管(PLED)的阳极和空穴注入层之间插入超薄NiO层,实现了聚合物发光二极管(PLED)的性能增强。对于PLED,以常用的氧化铟锡(ITO)作为阳极,有较大的能量势垒进行空穴注入。在ITO表面沉积薄层NiO后,由于NiO的功函数比ITO高,能垒降低,有利于空穴注入。因此,改善了电子和空穴电流的平衡,提高了PLED的性能。实验结果还表明,PLED的性能对NiO的厚度非常敏感。NiO层较厚导致器件电流密度降低,由于NiO的电阻率值高于ITO,导致PLED性能较差。结果表明,在1、2、4和8 nm中,1 nm是生产高效led的最佳NiO厚度。插入1 nm NiO后,PLED的最大电致发光强度几乎增加了一倍。
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