3D AND: A 3D Stackable Flash Memory Architecture to Realize High-Density and Fast-Read 3D NOR Flash and Storage-Class Memory

H. Lue, Guan-Ru Lee, T. Yeh, T. Hsu, C. Lo, Cheng-Lin Sung, Wei-Chen Chen, Chiatze Huang, Kuan-Yuan Shen, Meng-Yen Wu, Pishan Tseng, Min-Feng Hung, C. Chiu, K. Hsieh, Keh-Chung Wang, Chih-Yuan Lu
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引用次数: 4

Abstract

We demonstrate a 3D stackable AND-type Flash memory architecture for high-density and fast-read non-volatile memory solution. The device is based on a gate-all-around (GAA) macaroni thin-body device, with two vertical buried diffusion lines by N+ doped poly plug to connect all memory cells in a parallel way to achieve 3D AND-type array. High sensing current >6uA enables fast Tread ~100ns like NOR Flash, while the structure can enable hundreds of stacked layers eventually. Large transistor ON/OFF ratio of >5 orders, >5V Vt memory window, 100K Endurance, read-disturb free property, and small RTN are demonstrated in our 3D architecture using the BE-MANOS charge-trapping device. This architecture is promising to realize high-density 3D NOR Flash and future storage-class memory (SCM).
3D AND:实现高密度和快速读取的3D NOR闪存和存储级存储器的3D可堆叠闪存架构
我们展示了一种用于高密度和快速读取非易失性存储解决方案的3D可堆叠and型闪存架构。该器件基于栅极全能(GAA)通心粉薄体器件,用两条垂直埋置扩散线通过掺杂N+的聚塞将所有存储单元并联连接,实现3D and型阵列。>6uA的高传感电流可实现像NOR Flash一样的快进~100ns,而该结构最终可实现数百层堆叠。使用BE-MANOS电荷捕获装置,在我们的3D架构中演示了>5阶的大晶体管开/关比,>5V Vt存储窗口,100K耐久性,无读干扰特性和小RTN。该架构有望实现高密度3D NOR闪存和未来存储级存储器(SCM)。
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