{"title":"Fabricating novel diamond waveguides using the focused ion beam hard mask","authors":"W. McKenzie, M. Hiscocks, F. Ladouceur","doi":"10.1109/ACOFT.2010.5929925","DOIUrl":null,"url":null,"abstract":"The Focused ion beam has been used to direct write a hard mask against the plasma etching of diamond. Nano-waveguides were fabricated from diamond-on-silica thin films close to ideal dimensions predicted via FIMMWAVE simulations.","PeriodicalId":338472,"journal":{"name":"35th Australian Conference on Optical Fibre Technology","volume":"63 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"35th Australian Conference on Optical Fibre Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ACOFT.2010.5929925","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
The Focused ion beam has been used to direct write a hard mask against the plasma etching of diamond. Nano-waveguides were fabricated from diamond-on-silica thin films close to ideal dimensions predicted via FIMMWAVE simulations.