Design and analysis of 8T SRAM with assist schemes (UDVS) in 45nm CMOS

Ganesh Chokkakula, N. S. Reddy, Bhumarapu Devendra, S. S. Kumar
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引用次数: 1

Abstract

In modern ICs designing, the process of integrating more on-chip memories on a chip leads SRAMs to reason for a huge amount of total power and area of a chip. Therefore, memory designing with dynamic voltage scaling (DVS) capability is necessary. However, optimizing circuit operation over a wide range of voltage is not easy due to trade-offs of transistor characteristics in low-voltage and high-voltage. Ultra Dynamic Voltage Scaling (UDVS) techniques are used in low voltage levels to minimize the power consumption. Designing memories with DVS capability is gaining more importance since active as well as leakage power can be reduced by voltage scaling. UDVS is to scale the supply voltage by using assists circuits for different modes of the cell operation. In this paper three write assist circuits for reduction in power and 8T cell circuits have been designed. First one is Capacitive W-AC approach to reduce the level of cell supply voltage. Second scheme is Transient Negative Bit-line Voltage write assist scheme for write operation without using any on-chip or off-chip voltage sources and third one is transient negative bit line scheme in which write operation is performed by increasing the strength of SRAM pass transistor. Read operation for reading the data from the cell without altering (destructive read operation) the cell data with low power consumption. In this paper at last 8T SRAM cell in 45nm technology is implemented with operating voltage 1V.
45纳米CMOS中带辅助方案(UDVS)的8T SRAM设计与分析
在现代集成电路设计中,在芯片上集成更多片上存储器的过程导致sram导致芯片的总功率和面积巨大。因此,具有动态电压缩放(DVS)能力的存储器设计是必要的。然而,由于晶体管在低压和高压下的特性权衡,在大电压范围内优化电路工作并不容易。超动态电压缩放(UDVS)技术用于低电压水平,以尽量减少功耗。设计具有分布式交换机能力的存储器变得越来越重要,因为电压缩放可以降低有源功率和泄漏功率。UDVS是通过使用辅助电路来调整电源电压,以适应不同的电池运行模式。本文设计了三种降低功耗的写辅助电路和8T单元电路。第一种是电容式W-AC方法,以降低电池供电电压水平。第二种方案是暂态负位线电压写入辅助方案,用于写入操作而不使用任何片内或片外电压源;第三种方案是暂态负位线方案,其中通过增加SRAM通道晶体管的强度来执行写入操作。从单元格中读取数据而不改变(破坏性读取操作)的低功耗读取操作。本文在工作电压为1V的情况下,实现了45nm工艺下的8T SRAM单元。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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