Thermo-electromigration phenomenon of solder bump, leading to flip-chip devices with 5,000 bumps

K. Nakagawa, S. Baba, M. Watanabe, H. Matsushima, K. Harada, E. Hayashi, Q. Wu, A. Maeda, M. Nakanishi, N. Ueda
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引用次数: 10

Abstract

High performance logic devices have rapidly advanced in network system. In order to reply the demand of high pin count and high speed, Flip-chip BGA (FC-BGA) package applied high-density organic substrate has been developed. This package has the superior possibility of flexible bump locations by virtue of high via densities and fine line capabilities of the substrate. The feature of substrate is adopting the stacked method of finer via pitch layers. Utilizing the density, it is possible to either minimize the LSI die size or maximize the number of bumps on the die. Also at the high performance devices, the high current density through the bump is strongly demanded. In order to satisfy the demand and realize the high pin counts devices, thermo-electromigration phenomenon of solder bump is one of the key reliability items. The thermo-electromigration phenomenon of solder bump was investigated to be consisting of three steps as below. At 1/sup st/ step, the lead (Pb) migrates as electron flow under high-density current, and at 2/sup nd/ step, the Under Bump Metals (UBM) migrates and disappears. Finally at 3/sup rd/ step, Aluminum (Al) routing metal migrates and it results in open failure, and from the High Temperature Operating Life (HTOL) results, the life time of solder bump on current density has been estimated theoretically based on Black's equation. The lifetime was predicted more than 20 years with the current being 160 mA/bump in 220 /spl mu/m pitch cases.
焊料凹凸的热电迁移现象,导致倒装器件产生5000个凹凸
高性能逻辑器件在网络系统中得到了迅速发展。为了满足高引脚数和高速度的需求,开发了采用高密度有机衬底的倒装芯片BGA (FC-BGA)封装。由于高通孔密度和基板的细线能力,该封装具有灵活凹凸位置的优越可能性。衬底的特点是采用了细孔间距层的堆叠方法。利用密度,可以最小化LSI芯片尺寸或最大化芯片上的凸起数量。此外,在高性能器件中,强烈要求通过凸起的高电流密度。为了满足需求和实现高引脚数器件,凸点热电迁移现象是可靠性的关键问题之一。研究了焊料凸点的热电迁移现象,分为以下三个步骤。在1/sup /步时,铅(Pb)在高密度电流下随电子流迁移,在2/sup /步时,下碰撞金属(UBM)迁移并消失。最后,在3/sup /步,铝(Al)走线金属迁移导致开路失效,并根据高温工作寿命(HTOL)结果,基于Black方程,从理论上估计了电流密度下焊料凸点的寿命。在220 /spl mu/m螺距的情况下,电流为160 mA/bump,预计寿命超过20年。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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