On Approximate Estimation of Emitters Injection Ability Limit in p-i-n Structures

S. Shevchenko, B. V. Ivanov, A. Smirnov, V. Luchinin, V. Ilyin, A. Afanasyev
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Abstract

The classical theory of p-i-n rectifiers operation at high current densities [8] is generalized to the case of incomplete dopants ionization and bandgap narrowing in heavily doped regions. An impact of the following effects on the emitters injection coefficients in 4H-SiC p-i-n structures is shown. The limiting values of minority carriers' charges, which can be stored in heavily doped emitters of drift step recovery diodes, are estimated. A comparative analysis of Si and 4H-SiC p-i-n structures behavior has been carried out. The results of theoretical study are in reasonable agreement with the results of computer simulation in Synopsys Sentaurus TCAD software.
p-i-n结构中发射体注入能力极限的近似估计
p-i-n整流器在高电流密度下工作的经典理论[8]可以推广到掺杂剂不完全电离和重掺杂区带隙缩小的情况。结果表明,在4H-SiC p-i-n结构中,下列因素对发射体注入系数的影响。估计了漂移阶跃恢复二极管重掺杂发射体中可存储的少数载流子电荷的极限值。对比分析了Si和4H-SiC的p-i-n结构的性能。理论研究结果与Synopsys Sentaurus TCAD软件的计算机仿真结果有较好的一致性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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