An X-band Internally Matched GaN Power Amplifier with 705W Peak Power and 51.7% PAE

L. Gu, W. Feng, Sutong Zhou, Shijun Tang, Tao Chen, W. Che, Shuai Wang
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引用次数: 3

Abstract

One high power and high efficiency fully internally-matched GaN power amplifier operating at X band is presented. The device is realized by matching four GaN HEMT dies of 4*18-mm gate periphery. To reduce the size, single layer capacitors with high permittivity are used, and the impedance matching circuits are fabricated on AI2O3ceramic substrate. Within the frequency band of 8.2-8.8 GHz, the saturated output power, power gain and PAE of the device were measured as more than 660 W, 9.8 dB and 44.5% based on the pulse mode of 100 μs pulse width and 10% duty. Furthermore, the highest output power and PAE can reach to 705 W and 51.7% respectively. Due to the compact size of the package, 26mm x 17.4mm, the results show the highest output power at this frequency among the reported literatures.
一种峰值功率为705W、PAE为51.7%的x波段内匹配GaN功率放大器
提出了一种工作在X波段的高功率、高效率全内匹配GaN功率放大器。该器件是通过匹配4* 18mm栅极外围的4个GaN HEMT芯片实现的。为了减小尺寸,采用了高介电常数的单层电容,并在ai2o3陶瓷衬底上制作了阻抗匹配电路。在8.2 ~ 8.8 GHz频段内,在脉冲宽度为100 μs、占空率为10%的脉冲模式下,器件的饱和输出功率、功率增益和PAE分别大于660 W、9.8 dB和44.5%。最高输出功率可达705 W, PAE可达51.7%。由于封装的紧凑尺寸为26mm x 17.4mm,结果显示该频率下的输出功率在已报道的文献中最高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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