Dual-V/sub T/ SRAM cells with full-swing single-ended bit line sensing for high-performance on-chip cache in 0.13 /spl mu/m technology generation

F. Hamzaoglu, Y. Ye, A. Keshavarzi, K. Zhang, S. Narendra, S. Borkar, M. Stan, V. De
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引用次数: 6

Abstract

Comparisons among different dual-V/sub T/ design choices for a large on-chip cache with single-ended sensing show that the design using a dual-V/sub T/ cell and low-V/sub T/ peripheral circuits is the best, and provides 10% performance gain with 1.2x larger active leakage power, and 1.6% larger cell area compared to the best design using high-V/sub T/ cells.
具有全摆幅单端位线传感的双v /sub / SRAM单元,用于0.13 /spl mu/m技术一代的高性能片上缓存
对具有单端传感的大型片上缓存的不同双v /sub T/设计选择的比较表明,使用双v /sub T/电池和低v /sub T/外围电路的设计是最好的,与使用高v /sub T/电池的最佳设计相比,可以提供10%的性能增益,1.2倍的有源泄漏功率和1.6%的电池面积。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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