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0.12 /spl mu/m Optical Lithography Performance Using an Alternating DUV Phase Shift Mask

Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135) Pub Date : 1998-07-13 DOI:10.1109/IMNC.1998.729976
Y. Trouiller, N. Buffet, T. Mourier, P. Schiavone, Y. Quéré
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使用交变DUV相移掩模的0.12 /spl mu/m光刻性能
本文章由计算机程序翻译，如有差异，请以英文原文为准。
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Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)
Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)
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