Evaluation of the efficiency of the simplified simulator of the optical coating deposition process

A. N. Sharov, D. Lukyanenko, A. Tikhonravov, A. Yagola
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Abstract

The paper presents a comparison of the results of simulating the processes of deposition of optical coatings using a simplified simulator and a full simulator that takes into account the main error-producing factors of deposition processes and control of coating layer thicknesses. For the simulators under consideration, the distributions of error vector norms in the layer thicknesses of coating, layer error correlation coefficients, and error self-compensation coefficients are calculated. It is shown that the simplified simulator allows one to obtain adequate results for evaluating the deposition process of real multilayer optical coatings and, thus, can be used for faster modeling of a large number of coatings with further analysis of their stability against manufacturing errors.
光学镀膜过程简化模拟器的效率评价
本文比较了采用简化模拟器和考虑了沉积过程中主要误差产生因素和涂层厚度控制的完整模拟器对光学涂层沉积过程的模拟结果。对于所考虑的模拟器,计算了误差矢量范数在涂层层厚度、层误差相关系数和误差自补偿系数中的分布。结果表明,简化后的仿真器可以获得足够的结果来评估真实的多层光学涂层的沉积过程,因此可以用于快速建模大量涂层,并进一步分析其对制造误差的稳定性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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