Fabrication of PTFE-filled waveguide bandpass filter using SR direct etching

M. Kishihara, M. Kato, H. Ikeuchi, K. Murai, Y. Ukita, Y. Utsumi, T. Kawai, I. Ohta
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Abstract

A metallic waveguide is one of effective media for millimeter- and submillimeter-waves because of the advantage of low-loss. This paper describes trial fabrication of a PTFE-filled waveguide bandpass filter (BPF) with the use of the SR (synchrotron radiation) direct etching process of PTFE, sputter deposition of metal, and electroplating. PTFE is known as a difficult material to process at high precision. However, it has been reported that PTFE microstructures can be fabricated by the direct exposure to SR. In this paper, an iris-coupled waveguide BPF with 5-stage Chebyshev response is designed at Q-band, and the fabrication procedure for the PTFE-filled waveguide BPF is described. The measurement results of the fabricated BPF are shown.
用SR直接刻蚀法制备ptfe填充波导带通滤波器
金属波导具有低损耗的优点,是毫米波和亚毫米波传输的有效介质之一。本文介绍了利用同步辐射法直接刻蚀PTFE、溅射沉积金属、电镀等工艺制备PTFE填充波导带通滤波器(BPF)的方法。聚四氟乙烯是一种难以高精度加工的材料。本文设计了一种在q波段具有5级切比雪夫响应的虹膜耦合波导BPF,并介绍了该波导BPF的制备过程。最后给出了所制BPF的测量结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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