{"title":"Online optimized parameters for RLS-LT controller - application to processes with mixed products and feature aging","authors":"G. Graton, E. E. Adel, M. Ouladsine, J. Pinaton","doi":"10.1109/ICOSC.2016.7507071","DOIUrl":null,"url":null,"abstract":"This paper presents an iterative approach, which provides optimal solutions of the best achievement performance in the case of closed-loop aged-based processes applied on semiconductor manufacturing industry. The aim is to provide an online parameter estimation of RLS-LT controller in the case of mixed product Run-to-Run (RtR) control. The online estimation is done without any a priori knowledge of process parameters and noise structure. The best achievement performance improvement is illustrated using a simulation problem from literature and the example is applied on the removal rate control in a Chemical Mechanical Polishing (CMP) process.","PeriodicalId":149249,"journal":{"name":"2016 5th International Conference on Systems and Control (ICSC)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-05-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 5th International Conference on Systems and Control (ICSC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICOSC.2016.7507071","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This paper presents an iterative approach, which provides optimal solutions of the best achievement performance in the case of closed-loop aged-based processes applied on semiconductor manufacturing industry. The aim is to provide an online parameter estimation of RLS-LT controller in the case of mixed product Run-to-Run (RtR) control. The online estimation is done without any a priori knowledge of process parameters and noise structure. The best achievement performance improvement is illustrated using a simulation problem from literature and the example is applied on the removal rate control in a Chemical Mechanical Polishing (CMP) process.