Ultra-Soft and High Magnetic Moment NiFe Films Prepared via Electrodeposition from A Cu2+ Contained Solution

B. Zong, G. Han, Y. Zheng, K. Li, Z. Guo, J. Qiu, Liang Wang, Z. Liu, L. An, P. Luo, H. Li, B. Liu
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引用次数: 1

Abstract

In this paper, a novel approach to fabricate ultra-soft magnetic NiFe films was reported. The films were prepared from a sulfate salt based solution containing a little quantity of Cu2+ additive via electrodeposition, which is well known as a cheap and simple way to prepare metal films. Atomic force microscopy showed that the film thickness ranged from tens of nanometers to micrometers. Magnetic characterization was performed using vibrating sample magnetometer (VSM) and quantum design superconducting quantum interfaces device magnetometer (SQID). Results showed that the film possessed very soft magnetic property with an easy axis coercivity (Hce) and hard axis coercivity (Hch) no bigger than 0.15, 0.04 Oe, respectively. The film also had a high saturation magnetization of almost 1.65 T and good anisotropy.
含Cu2+溶液电沉积制备超软高磁矩NiFe薄膜
本文报道了一种制备超软磁NiFe薄膜的新方法。在硫酸盐盐基溶液中加入少量Cu2+添加剂,通过电沉积法制备薄膜,这是一种廉价而简单的金属薄膜制备方法。原子力显微镜显示膜的厚度从几十纳米到微米不等。采用振动样品磁强计(VSM)和量子设计超导量子界面器件磁强计(SQID)进行了磁性表征。结果表明,该薄膜具有很好的软磁性能,易轴矫顽力(Hce)和硬轴矫顽力(Hch)分别不大于0.15和0.04 Oe。该薄膜具有接近1.65 T的高饱和磁化强度和良好的各向异性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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