Compact 5G n77 Band Pass Filter with Through Silicon Via (TSV) IPD Technology

K. Shin, Jennifer Arendell, K. Eilert
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引用次数: 9

Abstract

a compact size 5G n77 band-pass filter (BPF) design fabricated with a Through Silicon Via (TSV) Integrated Passive Device (IPD) process is presented in this paper. Insertion loss ≤ 2.2 dB with ≥ 30dB attenuation at 2.7GHz, 5.18GHz, and ISM band is achieved in a standard 1608 baseline design plus TSV add-on. The proposed design provides >20dB wideband attenuation up to 10GHz with low package variation and added thermal via introduced by TSV process. Therefore, this Silicon IPD with TSV design can support low cost, compact dimension, high precision, and high power requirement of 5G filter. Model correlation is verified through on wafer measurement.
紧凑型5G n77带通滤波器,采用通硅孔(TSV) IPD技术
本文介绍了一种紧凑尺寸的5G n77带通滤波器(BPF)设计,该滤波器采用透硅孔(TSV)集成无源器件(IPD)工艺制造。在2.7GHz、5.18GHz和ISM频段,插入损耗≤2.2 dB,衰减≥30dB,通过标准1608基线设计加上TSV插件即可实现。该设计提供了>20dB的宽带衰减,高达10GHz,封装变化小,并通过TSV工艺引入了额外的热损耗。因此,采用TSV设计的硅IPD可以支持5G滤波器的低成本、小尺寸、高精度和高功耗要求。通过对薄片的测量验证了模型的相关性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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