Design of aperture distributions for difference pattern from Taylor distributions

Abstract

A novel design method is proposed with which difference patterns and their aperture distributions can be deduced from Taylor distributions. The peak sidelobe level in the difference pattern can be easily controlled. A formula for evaluating the sidelobe level of the difference pattern is given in which two parameters, the number of elements and the sidelobe level of the Taylor distribution, are included. The sidelobe level for the Taylor distribution is calculated to give the sidelobe level for the desired difference pattern.<>