M. Micjan, J. Nevrela, M. Novota, S. Flickyngerová, P. Juhasz, J. Uhrik, J. Jakabovic, M. Weis
{"title":"Ferroelectric polymer films for flexible memory devices","authors":"M. Micjan, J. Nevrela, M. Novota, S. Flickyngerová, P. Juhasz, J. Uhrik, J. Jakabovic, M. Weis","doi":"10.1109/ASDAM.2014.6998654","DOIUrl":null,"url":null,"abstract":"Here we demonstrate application of organic ferroelectric insulating material: copolymer vinylidene fluoride and trifluoroethylene P(VDF-TrFE) for organic memory devices. The metal-insulator-metal structures have been used to study the ferroelectric properties and represent the model applications for ferroelectric field-effect transistors (FeFETs) and ferroelectric random access memories (FRAM). The current-voltage and capacitance-voltage characteristics depicted ferroelectric switching phenomenon present in thin-film structures and polarization properties have been analysed. This work describes the MIM device fabrication technology as well as the evaluation of material properties: saturated polarization, maximum electric field intensity, critical electric field, and relative dielectric constant.","PeriodicalId":313866,"journal":{"name":"The Tenth International Conference on Advanced Semiconductor Devices and Microsystems","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2014-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Tenth International Conference on Advanced Semiconductor Devices and Microsystems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASDAM.2014.6998654","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Here we demonstrate application of organic ferroelectric insulating material: copolymer vinylidene fluoride and trifluoroethylene P(VDF-TrFE) for organic memory devices. The metal-insulator-metal structures have been used to study the ferroelectric properties and represent the model applications for ferroelectric field-effect transistors (FeFETs) and ferroelectric random access memories (FRAM). The current-voltage and capacitance-voltage characteristics depicted ferroelectric switching phenomenon present in thin-film structures and polarization properties have been analysed. This work describes the MIM device fabrication technology as well as the evaluation of material properties: saturated polarization, maximum electric field intensity, critical electric field, and relative dielectric constant.