Masashi Yamamoto, Tomohiro Shiroi, T. Shikama, S. Nagaoka, H. Horibe
{"title":"Photoresist removal using hydrogen radicals produced by tantalum hot-wire catalyst","authors":"Masashi Yamamoto, Tomohiro Shiroi, T. Shikama, S. Nagaoka, H. Horibe","doi":"10.1063/1.5124640","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":377067,"journal":{"name":"NANOSCIENCE AND NANOTECHNOLOGY: NANO-SciTech","volume":"59 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"NANOSCIENCE AND NANOTECHNOLOGY: NANO-SciTech","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/1.5124640","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}