Preparation and physical properties of MoO3 thin films

Abstract

Thin films of MoO3 were prepared by electron beam evaporation technique. The films were deposited onto glass substrates maintained at temperatures in the range 100 - 250 degrees Celsius. The films were characterized by studying their structure, electrical and optical properties. The films formed at 100 degrees Celsius are amorphous with conductivity of about 2.5 X 10-5 (Omega) -1 cm-1. The effect of deposition temperature on the properties of the films were studied and discussed.