Impact of edge defects on the synaptic characteristic of a ferromagnetic domain-wall device and on on-chip learning

Ram Singh Yadav, Aniket Sadashiva, Amod Holla, P. Muduli, D. Bhowmik
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Abstract

Topological-soliton-based devices, like the ferromagnetic domain-wall device, have been proposed as non-volatile memory (NVM) synapses in electronic crossbar arrays for fast and energy-efficient implementation of on-chip learning of neural networks (NN). High linearity and symmetry in the synaptic weight-update characteristic of the device (long-term potentiation (LTP) and long-term depression (LTD)) are important requirements to obtain high classification/regression accuracy in such an on-chip learning scheme. However, obtaining such linear and symmetric LTP and LTD characteristics in the ferromagnetic domain-wall device has remained a challenge. Here, we first carry out micromagnetic simulations of the device to show that the incorporation of defects at the edges of the device, with the defects having higher perpendicular magnetic anisotropy compared to the rest of the ferromagnetic layer, leads to massive improvement in the linearity and symmetry of the LTP and LTD characteristics of the device. This is because these defects act as pinning centres for the domain wall and prevent it from moving during the delay time between two consecutive programming current pulses, which is not the case when the device does not have defects. Next, we carry out system-level simulations of two crossbar arrays with synaptic characteristics of domain-wall synapse devices incorporated in them: one without such defects, and one with such defects. For on-chip learning of both long short-term memory networks (using a regression task) and fully connected NN (using a classification task), we show improved performance when the domain-wall synapse devices have defects at the edges. We also estimate the energy consumption in these synaptic devices and project their scaling, with respect to on-chip learning in corresponding crossbar arrays.
边缘缺陷对铁磁畴壁器件突触特性及片上学习的影响
基于拓扑孤子的器件,如铁磁畴壁器件,已被提出作为电子横杆阵列中的非易失性存储器(NVM)突触,用于快速和节能地实现片上神经网络(NN)的学习。在这种片上学习方案中,突触权重更新特性(长期增强(LTP)和长期抑制(LTD))的高度线性和对称性是获得高分类/回归精度的重要要求。然而,在铁磁畴壁器件中获得这种线性和对称的LTP和LTD特性仍然是一个挑战。在这里,我们首先对该器件进行了微磁模拟,结果表明,与铁磁层的其他部分相比,在器件边缘加入缺陷具有更高的垂直磁各向异性,从而大大改善了器件的LTP和LTD特性的线性和对称性。这是因为这些缺陷充当了畴壁的固定中心,并防止畴壁在两个连续编程电流脉冲之间的延迟时间内移动,而当器件没有缺陷时则不是这种情况。接下来,我们进行了两种交叉棒阵列的系统级模拟,其中包含了域壁突触器件的突触特性:一种没有这种缺陷,一种有这种缺陷。对于长短期记忆网络(使用回归任务)和全连接神经网络(使用分类任务)的片上学习,当畴壁突触设备在边缘有缺陷时,我们显示了改进的性能。我们还估计了这些突触设备的能量消耗,并投影了它们的缩放,相对于片上学习在相应的交叉棒阵列。
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CiteScore
5.90
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