Optimization of Wafer Thinning Process by Reducing Thickness Variation of Temporary Adhesive Layer for Medical Device

Ken Yamamoto, Takuro Suyama, Noriyuki Fujimori
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Abstract

This study focuses on optimization of wafer thinning process by reducing the thickness variation of the temporary adhesive layer. To optimize edge trimming parameters, we evaluated the edge bead height and the width of the adhesive layer coated on the device wafer. After optimizing edge trimming parameters, the thickness distribution of the device wafer and the adhesive layer after thinning was evaluated. There was no difference in the thickness distribution of the device wafer and the adhesive layer after thinning regardless of whatever the edge trimming was applied or not. In contrast, peeling occurred at the edge of the bonded wafer only in the wafer without edge trimming. By measuring the surface shape of the glass wafer at the edge part, it was found that the wafer without edge trimming had a larger deflection than the wafer with edge trimming. Edge trimming is conventionally performed to prevent an edge chipping. Moreover, it has been confirmed that it is also effective to prevent a peeling of a wafer from a supporting substrate.
减少医疗器械临时粘接层厚度变化优化晶圆减薄工艺
本研究的重点是优化晶圆减薄工艺,减少临时粘接层的厚度变化。为了优化边缘修整参数,我们评估了涂覆在器件晶圆上的胶粘剂层的边缘珠高度和宽度。优化边缘修整参数后,对减薄后的器件晶片和粘接层厚度分布进行了评价。无论是否进行边缘修整,减薄后的器件晶片和粘附层厚度分布没有差异。相比之下,仅在未进行边缘修剪的晶圆中,粘合晶圆的边缘发生剥落。通过对边缘部分玻璃晶圆表面形状的测量,发现没有边缘修整的晶圆比有边缘修整的晶圆有更大的挠度。通常进行边缘修剪以防止边缘切屑。此外,已证实它也有效地防止晶圆片从支撑基板上剥落。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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