GaAs MMIC pHEMT gate metal thermometry

B. Schwitter, A. Parker, S. Albahrani, A. Fattorini, M. Heimlich
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引用次数: 1

Abstract

A thermal resistance measurement technique which exploits the thermal response of a GaAs pHEMT's gate metal resistance is examined. It is found that gate leakage (hole) current due to impact ionization can interfere with the measurement, but can be avoided with correct choice of bias. Measurements and thermal simulations conclude that the bias dependence of the channel heat source profile needs to be considered to improve the accuracy of channel temperature estimation.
GaAs MMIC pHEMT栅极金属测温
研究了利用砷化镓pHEMT栅极金属电阻热响应的热阻测量技术。研究发现,冲击电离产生的栅极漏(孔)电流会对测量产生干扰,但通过正确选择偏置是可以避免的。测量和热模拟表明,为了提高通道温度估计的准确性,需要考虑通道热源分布的偏置依赖性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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