Four-port Deembedding Technique for FET Devices Mounted in Hybrid Test Fixture

M. Medina, D. Schreurs, B. Nauwelaers
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引用次数: 2

Abstract

High frequency devices aimed for power applications cannot be characterized by on-wafer measurements due to power dissipation constraints. Therefore characterization using test fixture is necessary. Latest techniques applied to on-wafer devices use a four-port characterization of the extrinsic network surrounding the device. Nevertheless, this cannot be applied straightforwardly to the test fixture case due to the fact that the ground reference of the device is not the same as the measurement, and this effect increases with frequency. A five-port definition would lead to an accurate characterization, but with the increase of the complexity of the problem. This paper presents an alternative technique based on four-port de-embedding technique with a correction of the local ground effect by using two cold-FET measurements and a simplification of the four-port matrix model
混合测试夹具中FET器件的四端口去嵌入技术
由于功耗限制,用于功率应用的高频器件不能通过晶圆上测量来表征。因此,使用测试夹具进行表征是必要的。应用于晶圆器件的最新技术使用围绕器件的外部网络的四端口表征。然而,这不能直接应用到测试夹具的情况下,由于设备的接地参考是不一样的测量,这种影响随着频率增加。五个端口的定义将导致准确的特征,但随着问题复杂性的增加。本文提出了一种基于四端口去嵌入技术的替代技术,该技术通过使用两次冷场效应管测量和简化四端口矩阵模型来校正局部地效应
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