CMOS-MEMS resonator parametric variation analysis through equivalent circuit modeling

M. U. Mian, J. Dennis, M. Khir, N. Y. Sutri, A. Ahmed, T. Tang
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Abstract

In this paper, we report a micro electro mechanical system (MEMS) shuttle resonator fabricated on CMOS-MEMS wafer technique. The resonator operates at the resonant frequency when a current flows through the metal layers in the presence of an external magnetic field. We investigate the resonant frequency and amplitude shifts due to parametric variation in beam length, width, and structure thickness in resonator motion. The theoretical formulation of the equivalent circuit model is presented. Simulation of resonator with variations are carried out using equivalent circuit model, these variations are based on fabrication foundry tolerance range. Simulation results show a range of operational frequencies in which the resonator can perform under the fabrication tolerances provided by the foundry.
基于等效电路建模的CMOS-MEMS谐振器参数变化分析
本文报道了一种基于CMOS-MEMS晶圆技术的微机电系统(MEMS)穿梭谐振器。当电流在存在外部磁场的情况下流过金属层时,谐振器以谐振频率工作。我们研究了谐振腔运动中由于光束长度、宽度和结构厚度的参数变化而引起的谐振频率和振幅变化。给出了等效电路模型的理论表达式。利用等效电路模型对谐振腔的变化进行了仿真,这些变化是基于制造和铸造公差范围的。仿真结果表明,在铸造厂提供的制造公差范围内,谐振器可以在一定范围内工作。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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