J.H. Lee, S.H. Lee, W. Kim, H. Lee, J. Heo, T. Jeong, C. Choi, J.M. Kim
{"title":"Uniformity measurement of electron emission from carbon using electron beam resist","authors":"J.H. Lee, S.H. Lee, W. Kim, H. Lee, J. Heo, T. Jeong, C. Choi, J.M. Kim","doi":"10.1109/IVNC.2004.1354896","DOIUrl":null,"url":null,"abstract":"In this report, the direct measurement of the emission sites from practically working CNT emitters is presented using an electron resist (ER) coated anode substrate. It allows checking a detailed emission site distribution from randomly oriented CNT emitters without light spreading effect when using a phosphor screen. The estimation of emission uniformity is best performed by general image comparison containing many dots of the developed ER surface images.","PeriodicalId":137345,"journal":{"name":"Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)","volume":"136 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVNC.2004.1354896","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
In this report, the direct measurement of the emission sites from practically working CNT emitters is presented using an electron resist (ER) coated anode substrate. It allows checking a detailed emission site distribution from randomly oriented CNT emitters without light spreading effect when using a phosphor screen. The estimation of emission uniformity is best performed by general image comparison containing many dots of the developed ER surface images.