Surface treatment of thin films deposited by plasma PECVD prepared for an application as biocide material

Abstract

In this work, properties of thin films deposited by plasma enhanced chemical vapor (PECVD) method have been studying. Films have been elaborated from pure HMDSO precursor and/or mixed with different proportion of oxygen gas. Contact angle measurement reveal that deposited films have a hydrophobic character for films deposited from pure Hexamethyldisiloxane (HMDSO) with contact angle value around 110°. Whereas, contact angle decrease gradually with oxygen proportion to achieve 17° for film deposited from 90% oxygen proportion, which indicated that deposited films have hydrophilic character. FTIR analyses and optical emission spectroscopy analyses has been used to investigate the physicchemical properties of deposited films.