Influence of target-target distance for composition distribution in new facing targets sputtering

Abstract

Combinatorial New-Facing Targets Sputtering (combi-NFTS) is one of the co-sputtering method applied to the combinatorial method. Combi-NFTS could easily control the composition range by changing the distance from substrate to targets. Furthermore composition gradient is relatively linear comparing to other thin film deposition method. In this paper, the influence of the distance between target and target gives for the composition distribution is investigated. As a result, it was elucidated that composition distribution and gradient increase as the TT distance increase. This is caused by the peak position of amount of deposited sputtering atom on the substrate change by the TT distance.