Atomic Mechanics Simulation on Nucleation Process of Grain Boundary Groove in Aluminum Conductor of Microelectronic Packages

T. Kitamura, R. Ohtani, T. Yamanaka, K. Yashiro
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引用次数: 2

Abstract

Failure of microelement such as a conductor in an LSI originates mostly from an atomic-scale defect. In this study, the nucleation process of grain boundary groove in an aluminum conductor is analyzed in terms of atomic mechanics. The motion of atoms near an intersection between grain boundary and surface near the melting temperature is simulated by the molecular dynamics. It, however, is impossible to analyze initiation of groove at the intersection in an actual component at its operating temperature by the molecular dynamics because the simulation can only reproduce the behavior of atoms over a very short period (about 10 -9 sec) due to the limitation of computational resources. A Monte Carlo method to simulate the atomic behavior in a longer period is proposed, focusing on the jumps of atoms along the surface. The grooving at a reasonable temperature is successfully simulated by the proposed method.
微电子封装铝导体晶界槽形核过程的原子力学模拟
在大规模集成电路中,导体等微元件的失效大多是由原子尺度的缺陷引起的。本文从原子力学的角度分析了铝导体晶界槽的成核过程。用分子动力学方法模拟了熔点附近晶界与表面交点附近原子的运动。然而,由于计算资源的限制,模拟只能在很短的时间内(约10 -9秒)再现原子的行为,因此无法通过分子动力学来分析实际组件在其工作温度下的交点处的凹槽起始。提出了一种蒙特卡罗方法来模拟原子在较长时间内的行为,重点关注原子沿表面的跳跃。该方法成功地模拟了合理温度下的开槽过程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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