Coupling between metallic microstrips on dielectric sustrates

Abstract

The analysis and simulation of the coupling between microstrips is realized, showing the corresponding capacitive or inductive walls. We analyze their interference and the changes produced in the electric and magnetic fields, as well as the distance dependence of the interference. The conductive lines on silicon and their crosstalk, produced when their distance is shorter that their width, is considered. The simulations were carried out with FEMLAB.