Soft X-ray Projection Lithography Technology*

Abstract

Recent analyses of critical system issues in Soft X-ray Projection Lithography are discussed. An overall system design provides detailed requirements (specifications) for x-ray mirror reflectivity, source power and parameters, resist sensitivity, etc. A cost analysis for SXPL systems leads to important requirements for x-ray mirror technology. An analysis of power loading limitations on precision SXPL imaging optics has important implications for source power and x-ray mirror reflectivity requirements.