{"title":"Thermal stability of ultrafast laser-generated stress in fused silica","authors":"Carolyn Hokin, Brandon D. Chalifoux","doi":"10.1117/12.2677504","DOIUrl":null,"url":null,"abstract":"Ultrafast Laser Stress Figuring (ULSF) is a new process for shaping thin optics. The stability of ULSF generated stress, at room temperature and at elevated temperatures, is unknown. Exposing laser-figured samples to elevated temperature acts as a proxy for testing long-term stability of ultrafast laser-generated stress. We conducted an isochronal annealing study up to 500 °C, on fused silica wafers, figured with single-Zernike deformation components, measuring their shape after each cycle. We track changes in those deformations, demonstrating that figured samples show small amounts of relaxation under increasing temperature, beginning around 200-300 °C. This suggests ULSF produces stable mirror figuring only up to ~200 °C temperatures. Combined with previous measurements, this suggests ULSF may exhibit long-term stability at room-temperature.","PeriodicalId":434863,"journal":{"name":"Optical Engineering + Applications","volume":"34 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Engineering + Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2677504","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Ultrafast Laser Stress Figuring (ULSF) is a new process for shaping thin optics. The stability of ULSF generated stress, at room temperature and at elevated temperatures, is unknown. Exposing laser-figured samples to elevated temperature acts as a proxy for testing long-term stability of ultrafast laser-generated stress. We conducted an isochronal annealing study up to 500 °C, on fused silica wafers, figured with single-Zernike deformation components, measuring their shape after each cycle. We track changes in those deformations, demonstrating that figured samples show small amounts of relaxation under increasing temperature, beginning around 200-300 °C. This suggests ULSF produces stable mirror figuring only up to ~200 °C temperatures. Combined with previous measurements, this suggests ULSF may exhibit long-term stability at room-temperature.