Micromagnetic calculation of erasure fields in perpendicular recording

O. Heinonen
{"title":"Micromagnetic calculation of erasure fields in perpendicular recording","authors":"O. Heinonen","doi":"10.1109/INTMAG.2006.376166","DOIUrl":null,"url":null,"abstract":"The author has performed fully micromagnetic dynamic modeling of systems consisting of a perpendicular writer and a soft underlayer. The writer was approximately 9500 nm tall and 8000 nm wide, with two return poles each 1300 nm thick located 1600 nm from the yoke or top pole. The yoke thickness was 300 nm, and the top pole was 200 nm thick with a width of the pole tip of 160 nm. Dual three-turn coils were used to energize the writer with a current of 30 mA (0-to-peak). The writer was located 20 nm above a 120 nm thick soft underlayer. The entire system was modeled at a resolution of 20 nm everywhere with a time resolution of about 2.5 ps.","PeriodicalId":262607,"journal":{"name":"INTERMAG 2006 - IEEE International Magnetics Conference","volume":"88 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"INTERMAG 2006 - IEEE International Magnetics Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/INTMAG.2006.376166","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

The author has performed fully micromagnetic dynamic modeling of systems consisting of a perpendicular writer and a soft underlayer. The writer was approximately 9500 nm tall and 8000 nm wide, with two return poles each 1300 nm thick located 1600 nm from the yoke or top pole. The yoke thickness was 300 nm, and the top pole was 200 nm thick with a width of the pole tip of 160 nm. Dual three-turn coils were used to energize the writer with a current of 30 mA (0-to-peak). The writer was located 20 nm above a 120 nm thick soft underlayer. The entire system was modeled at a resolution of 20 nm everywhere with a time resolution of about 2.5 ps.
垂直记录中擦除场的微磁计算
作者对由垂直书写器和软底层组成的系统进行了全微磁动力学建模。作者大约9500纳米高,8000纳米宽,两个返回杆每个1300纳米厚位于1600纳米的轭或顶杆。轭架厚度为300 nm,顶极厚度为200 nm,极尖宽度为160 nm。使用双三匝线圈以30毫安(0至峰值)的电流为书写器供电。作者位于120纳米厚的软底层上方20纳米处。整个系统的建模分辨率为20nm,时间分辨率约为2.5 ps。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信