Structural, chemical and magnetic characterization of electrodeposited CoFeCu material

Proceedings. The 16th International Conference on Microelectronics, 2004. ICM 2004. Pub Date : 2004-12-06 DOI:10.1109/ICM.2004.1434752

B. Benfedda, N. Benbrahim, A. Adri, Y. Dahmane

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引用次数: 2

Abstract

Electrodeposition of the iron group metals (Fe, Co, Ni) magnetic thin films has attracted much attention due to their potential applications in computer read/write heads. Electrodeposition is an inexpensive method for generating films with a high technological potential. Most investigation studied the effects of processing deposition condition such as pH, temperature, surtension, additives. In this present work, we propose to study the effect of boric acid and potential on the electrodeposition of CoFeCu. Film thickness was measured with the quartz crystal of the electrochemical quartz microbalance (EQCM) and composition was determined by energy dispersive X-ray spectroscopy (EDX). Crystalline structure was investigated by X-ray diffraction (XRD). The magnetic properties were determined by vibrating sample magnetometer (VSM). It was found that increasing the boric acid concentration affects the structure and the composition of the formed CoFeCu. The morphology of deposits as a function of the boric acid concentration was investigated by SEM. It reveals a smooth surface with regular grain size for the different boric acid concentration. CoFeCu prepared exhibits a Bs value of 19 to 20 KG and a coercive field more than 50e.

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电沉积CoFeCu材料的结构、化学和磁性表征

电沉积铁族金属(Fe, Co, Ni)磁性薄膜因其在计算机读写磁头中的潜在应用而备受关注。电沉积是一种廉价的薄膜制备方法，具有很高的技术潜力。大多数研究研究了加工沉积条件如pH、温度、表面张力、添加剂等的影响。在本研究中，我们拟研究硼酸和电位对CoFeCu电沉积的影响。用电化学石英微天平(EQCM)的石英晶体测量薄膜厚度，并用能量色散x射线光谱(EDX)测定其成分。用x射线衍射(XRD)研究了晶体结构。用振动样品磁强计(VSM)测定了其磁性能。结果表明，硼酸浓度的增加会影响合成的CoFeCu的结构和组成。用扫描电镜研究了硼酸浓度对镀层形貌的影响。在不同硼酸浓度下，它显示出光滑的表面和规则的晶粒尺寸。制备的CoFeCu的Bs值为19 ~ 20kg，矫顽力场大于50e。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Proceedings. The 16th International Conference on Microelectronics, 2004. ICM 2004.

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