Analysis of structure characteristics and internal electron diffusion characteristics of GaAs

Yuehua Wang, Yitao Cao, YunZe Qiu, Y. Qiu
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Abstract

GaAs material has excellent photoelectric properties and is the most sensitive vacuum semiconductor material in the visible light band. GaAs photocathode has become the core component of low-light-level night vision device and been widely used in the field of low-light-level night vision. We systematically analyzed the structural characteristics of the low-light image intensifier and defined the boundary conditions of GaAs electron emission. It provided calculation basis for further analysis of the photoelectric effect of GaAs photocathode. We established GaAs crystal model on first-principle, calculated the energy band structure, and analyzed the mechanism of surface electrons escaping. After photon energy transferring to the electronic, electrons were excited and went out of its orbit, becoming free electrons and gaining initial kinetic energy. According to the experience, we assumed the collision energy loss rate after free electron diffusion process, and calculated number of electron collision in crystal model and displacement distance. Linear displacement distance is electron diffusion length. The initial kinetic energy of electrons excited by GaAs material depends on the energy of incident photons, as well as on the cathode's own temperature. We analyzed the relationship between the electron diffusion length of the material and the temperature. The electron emission characteristics of GaAs material were summarized, which provided technical support for the subsequent process research of this cathode material. GaAs low light image intensifier is made of the following parts: photocathode、 MCP、 screen and high voltage power. Using the elastic collision model, we calculated the energy of the photon transported to the electron transfer. Assuming the collision energy loss rate of electronic diffusion is 20% every time, free electrons crash until photon energy losses. The collision frequency and the moving distance are GaAs material properties. We analyzed the relationship between the temperature and electron diffusion length of GaAs in this paper.
砷化镓的结构特性及内部电子扩散特性分析
GaAs材料具有优异的光电性能,是可见光波段中最敏感的真空半导体材料。砷化镓光电阴极已成为微光夜视器件的核心部件,在微光夜视领域得到了广泛的应用。系统分析了弱光像增强器的结构特点,确定了GaAs电子发射的边界条件。为进一步分析砷化镓光电阴极的光电效应提供了计算依据。基于第一性原理建立了GaAs晶体模型,计算了晶体的能带结构,分析了表面电子逸出的机理。光子能量传递给电子后,电子被激发出轨道,成为自由电子,获得初始动能。根据经验,假设了自由电子扩散过程后的碰撞能量损失率,计算了晶体模型中电子碰撞次数和位移距离。线性位移距离为电子扩散长度。受GaAs材料激发的电子的初始动能取决于入射光子的能量,以及阴极自身的温度。分析了材料的电子扩散长度与温度的关系。总结了GaAs材料的电子发射特性,为该正极材料的后续工艺研究提供了技术支持。GaAs弱光像增强器由光电阴极、MCP、屏和高压电源等部分组成。利用弹性碰撞模型,我们计算了光子传递到电子转移的能量。假设每次电子扩散的碰撞能量损失率为20%,自由电子碰撞直到光子能量损失。碰撞频率和移动距离是GaAs材料的性质。本文分析了温度与砷化镓电子扩散长度的关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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