Impact of lithographic irregularity across mm-scale photonic-crystal notch filters

CLEO/Europe - EQEC 2009 - European Conference on Lasers and Electro-Optics and the European Quantum Electronics Conference Pub Date : 2009-06-14 DOI:10.1109/CLEOE-EQEC.2009.5194810

A. Talneau, F. Lemarchand, A. Fehrembach, A. Sentenac

引用次数: 0

Abstract

We investigate the impact of electronic lithography writing conditions on the performances of two-dimensional grating notch filters fabricated on SiO2/Ta2O5 stack. Field stitching errors as well as electron beam writing step are considered.

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毫米尺度光子晶体陷波滤波器光刻不均匀性的影响

研究了电子光刻书写条件对在SiO2/Ta2O5叠层上制备的二维光栅陷波滤波器性能的影响。考虑了场拼接误差和电子束写入步长。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

CLEO/Europe - EQEC 2009 - European Conference on Lasers and Electro-Optics and the European Quantum Electronics Conference

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