NV-centers in SiC: A solution for quantum computing technology?

K. Khazen, H. J. von Bardeleben
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引用次数: 2

Abstract

Spin S = 1 centers in diamond and recently in silicon carbide, have been identified as interesting solid-state qubits for various quantum technologies. The largely-studied case of the nitrogen vacancy center (NV) in diamond is considered as a suitable qubit for most applications, but it is also known to have important drawbacks. More recently it has been shown that divacancies (VSiVC)° and NV (VSiNC)- centers in SiC can overcome many of these drawbacks such as compatibility with microelectronics technology, nanostructuring and n- and p-type doping. In particular, the 4H-SiC polytype is a widely used microelectronic semiconductor for power devices for which these issues are resolved and large-scale substrates (300mmm) are commercially available. The less studied 3C polytype, which can host the same centers (VV, NV), has an additional advantage, as it can be epitaxied on Si, which allows integration with Si technology. The spectral range in which optical manipulation and detection of the spin states are performed, is shifted from the visible, 632 nm for NV centers in diamond, to the near infrared 1200–1300 nm (telecom wavelength) for divacancies and NV centers in SiC. However, there are other crucial parameters for reliable information processing such as the spin-coherence times, deterministic placement on a chip and controlled defect concentrations. In this review, we revisit and compare some of the basic properties of NV centers in diamond and divacancies and NV centers in 4H and 3C-SiC.
SiC中的nv中心:量子计算技术的解决方案?
金刚石中的自旋S = 1中心以及最近在碳化硅中的自旋S = 1中心已被确定为各种量子技术中有趣的固态量子比特。金刚石中的氮空位中心(NV)被广泛研究,被认为是适合大多数应用的量子比特,但它也有重要的缺点。最近的研究表明,SiC中的空位(VSiVC)°和NV (VSiNC)-中心可以克服许多这些缺点,例如与微电子技术、纳米结构和n型和p型掺杂的兼容性。特别是,4H-SiC多型是一种广泛应用于功率器件的微电子半导体,解决了这些问题,并且大规模衬底(300mm)已商品化。研究较少的3C多型,可以承载相同的中心(VV, NV),具有额外的优势,因为它可以外延在Si上,从而允许与Si技术集成。进行光学操作和自旋态检测的光谱范围从金刚石中NV中心的可见光632 nm转移到SiC中空位和NV中心的近红外1200-1300 nm(电信波长)。然而,对于可靠的信息处理,还有其他关键参数,如自旋相干时间、芯片上的确定位置和控制缺陷浓度。在这篇综述中,我们回顾和比较了金刚石中NV中心的一些基本性质以及4H和3C-SiC中NV中心的空位和空位。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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